Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions
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!Deposition rate | !Deposition rate | ||
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*1-10 Å/s Ti deposition rate ( | *1-10 Å/s Ti deposition rate (oxidized layer growth should be faster; actual growth rate will need testing) | ||
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*not yet known, probably faster than Sputter-System(Lesker) | *not yet known, probably faster than Sputter-System(Lesker) | ||