Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
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|560 °C (amorphous) and 620 °C (poly) | |560 °C (amorphous) and 620 °C (poly) | ||
|300 °C | |300 °C | ||
|room temperature | |||
|room temperature | |room temperature | ||
|room temperature to 600 °C | |room temperature to 600 °C | ||
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'''*''' If you wish to deposit a thicker layer than 100 nm please talk to responsible staff or write to thinfilm@nanolab.dtu.dk | |||