Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10: Difference between revisions
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<gallery caption="The results of the nano1.0 recipe" widths="250" heights="200" perrow="3"> | <gallery caption="The results of the nano1.0 recipe" widths="250" heights="200" perrow="3"> | ||
image:WF_2C5_feb2011_030.jpg|The 30 nm trenches | image:WF_2C5_feb2011_030.jpg|The 30 nm trenches | ||
image: | image:WF_2C5_feb2011_060.jpg|The 60 nm trenches | ||
image: | image:WF_2C5_feb2011_090.jpg|The 90 nm trenches | ||
image: | image:WF_2C5_feb2011_120.jpg|The 120 nm trenches | ||
image: | image:WF_2C5_feb2011_150.jpg|The 150 nm trenches | ||
C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, 10 degs, 120 secs | C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, 10 degs, 120 secs | ||
</gallery> | </gallery> | ||