Specific Process Knowledge/Lithography/Development: Difference between revisions

@@ Line 617: / Line 617: @@
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black"|
-Development of:
+Development of UV resists:
 *AZ nLOF
 *AZ MiR 701
 *AZ 5214E
 *AZ 4562
-*DUV resists
+Development of DUV resists:
+*KRF M230Y
+*KRF M35G
 |-
 !style="background:silver; color:black;" align="center" width="60"|Developer
@@ Line 634: / Line 636: @@
 |style="background:LightGrey; color:black"|Development
 |style="background:WhiteSmoke; color:black"|
-Spray/Puddle
+Puddle
 |-
 |style="background:LightGrey; color:black"|Handling
@@ Line 649: / Line 651: @@
 |style="background:LightGrey; color:black"|Agitation
 |style="background:WhiteSmoke; color:black"|
-none
+per 30 seconds:<br>
+Slow rotation of substrate for 1 second
 |-
 |style="background:LightGrey; color:black"|Rinse
@@ Line 667: / Line 670: @@
 *Film, or pattern, of all materials except Type IV
 |-
-|style="background:LightGrey; color:black"|Batch
+|style="background:LightGrey; color:black"|Batch size
 |style="background:WhiteSmoke; color:black"|
 |-
 |}