Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
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===Example images (1500 nm) | ===Example images (1500 nm)=== | ||
Undiluted nLOF2020 can also be used, in this case a 1500 nm thick resist is exposed at 160 µC/cm<sup>2</sup>. While it is possible to define lines down to about 100 nm the high aspect ratio will cause free standing lines to collapse as illustrated below. | Undiluted nLOF2020 can also be used, in this case a 1500 nm thick resist is exposed at 160 µC/cm<sup>2</sup>. While it is possible to define lines down to about 100 nm the high aspect ratio will cause free standing lines to collapse as illustrated below. | ||
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. Image: Thomas Pedersen. | 100 nm lines in 1500 nm thick nLOF2020. Image: Thomas Pedersen. | ||
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