Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
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Example images from left to right: 100 nm lines (4 µm FOV), 150 nm lines (4 µm FOV), 100 nm vernier scale lines (25 µm FOV), cartoon figures (25 µm FOV). Image: Thomas Pedersen. | Example images from left to right: 100 nm lines (4 µm FOV), 150 nm lines (4 µm FOV), 100 nm vernier scale lines (25 µm FOV), cartoon figures (25 µm FOV). Image: Thomas Pedersen. | ||
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===Example images (1500 nm) | |||
Undiluted nLOF2020 can also be used, in this case a 1500 nm thick resist is exposed at 160 µC/cm<sup>2</sup>. While it is possible to define lines down to about 100 nm the high aspect ratio will cause free standing lines to collapse as illustrated below. | |||
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| [[image:nLOF_1500nm_1.png|300px]] || [[image:nLOF_1500nm_2.png|300px]] | |||
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. Image: Thomas Pedersen. | |||
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