Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 3: | Line 3: | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
|- | |- | ||
| [[image:MixMatch.png| | | [[image:MixMatch.png|1044px]] | ||
|- | |- | ||
| colspan="1" style="text-align: center;| | | colspan="1" style="text-align: center;| | ||
The two different methods for pattern alignment. Image: Thomas Pedersen. | The two different methods for pattern alignment. Image: Thomas Pedersen. | ||
|} | |} | ||