Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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<!-- AFTER THE CONVERSION TO WRITE MODE 2, this data is no longer relevant. No official acceptance test was performed after the write mode conversion. | <!-- AFTER THE CONVERSION TO WRITE MODE 2, this data is no longer relevant. No official acceptance test was performed after the write mode conversion. TARAN 5/9-23 | ||
==Acceptance test== | ==Acceptance test== | ||
<span style="color:red">New specs after the new writehead has been installed - section will be updated soon.</span> | <span style="color:red">New specs after the new writehead has been installed - section will be updated soon.</span> | ||
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In order to get good alignment, it is advised to use four alignment marks for alignment, and to activate scaling (possibly also shearing) before starting the exposure. Optical or pneumatic auto-focus should not affect the result, but it is recommended to use the "High Res" camera for the final alignment of each mark in order to achieve the best overlay accuracy. Exposure using the fast mode decreases the overlay accuracy, since the address grid size is increased to 250 nm. | In order to get good alignment, it is advised to use four alignment marks for alignment, and to activate scaling (possibly also shearing) before starting the exposure. Optical or pneumatic auto-focus should not affect the result, but it is recommended to use the "High Res" camera for the final alignment of each mark in order to achieve the best overlay accuracy. Exposure using the fast mode decreases the overlay accuracy, since the address grid size is increased to 250 nm. | ||
<!-- AFTER THE CONVERSION TO WRITE MODE 2, this data is no longer relevant. | <!-- AFTER THE CONVERSION TO WRITE MODE 2, this data is no longer relevant. TARAN 6/9-23 | ||
'''Alignment accuracy:''' | '''Alignment accuracy:''' | ||