Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts the expected speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed of the machine for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 (2023-03-21) was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>. | According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts the expected speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed of the machine for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 (2023-03-21) was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>. | ||
When the exposure is started on the maskless aligner, the software starts converting the design to the image files needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample, while more image data is being generated in the background. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (and/or exposed) the data may be reused for repeated exposures. Due to no time lost waiting for data conversion, offline exposure may be several tens of % faster than online. However, the converted data can only be reused if no alignment is needed, including flat alignment ("Expose with substrate angle"/"Expose with Global Angle"). | |||
[[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]] | [[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]] | ||
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During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For smaller samples, the writing speed of Aligner: Maskless 02 drops below the specified writing speed for a full 100 x 100 mm substrate. | During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For smaller samples, the writing speed of Aligner: Maskless 02 drops below the specified writing speed for a full 100 x 100 mm substrate. | ||
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