Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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(This section was updated 05-09-2023 by taran@nanolab) | (This section was updated 05-09-2023 by taran@nanolab) | ||
According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 | According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed of the machine for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 (2023-03-21) was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>. | ||
[[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area]] | [[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]] | ||
'''Speed vs. area:''' | '''Speed vs. area:''' | ||
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[[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The exposure speed was measured using a 10 mm x 100 mm exposure area, but should be approximately the same for a full 100 mm | [[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The exposure speed was measured using a 10 mm x 100 mm exposure area, but should be approximately the same for a full 100 mm wafer exposure.]] | ||
'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||
The writing speed | The writing speed is constant up to a dose of 100 mJ/cm<sup>2</sup>, then drops with increasing dose. At 500 mJ/cm<sup>2</sup>, the writing speed is approximately the nominal speed of 500 mm<sup>2</sup>/min. As a rule of thumb, the writing time doubles every time the dose is doubled. | ||
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'''Speed vs. design:''' | '''Speed vs. design:''' | ||
<span style="color:red">New specs after the new writehead has been installed - section will be updated soon.</span> | <!-- <span style="color:red">New specs after the new writehead has been installed - section will be updated soon.</span> --> | ||
Depending on the complexity and density of the pattern, the conversion process may slow down the exposure significantly. A 100 mm wafer exposed with a pattern consisting of 200 million 5 µm circles took | Depending on the complexity and density of the pattern, the conversion process may slow down the exposure significantly. A 100 mm wafer exposed with a pattern consisting of 200 million 5 µm circles took more than 16 minutes (600 mm<sup>2</sup>/min), compared to the expected 8-9 minutes (1200 mm<sup>2</sup>/min). It took 6.5 minutes before the first stripe was exposed, and there were several pauses during the print (waiting for data from conversion). Even a simple 100 x 100 mm square takes 1.5 minutes to start printing, lowering the effective writing speed to 1000 mm<sup>2</sup>/min. | ||
The maskless aligner exposes the design in north-south oriented stripes (perpendicular to the flat). The stripes all have the same length, set by the height of the design, and only completely empty stripes are skipped. The writing speed may thus be affected by the layout of the design, as shown below. | The maskless aligner exposes the design in north-south oriented stripes (perpendicular to the flat). The stripes all have the same length, set by the height of the design, and only completely empty stripes are skipped. The writing speed may thus be affected by the layout of the design, as shown below. | ||
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| This design printed in | | This design printed in 2.5 minutes (640 mm<sup>2</sup>/min) || This design printed in less than 1 minute (1780 mm<sup>2</sup>/min) | ||
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