Specific Process Knowledge/Back-end processing/Micro transfer printer: Difference between revisions

From LabAdviser
Jehem (talk | contribs)
Jehem (talk | contribs)
No edit summary
Line 4: Line 4:


[[Category: Equipment|Backend]]
[[Category: Equipment|Backend]]
[[Category: Bckend]]
[[Category: Back-end_processing]]
 
 


__TOC__
__TOC__

Revision as of 10:43, 31 August 2023

The contents on this page, including all images and pictures, was created by DTU Nanolab staff unless otherwise stated.

Feedback to this page: click here

Stylus Profiler: Dektak150

TextTextTextTextTextText TextTextText

TextTextTextTextText TextTextText


Training videos

Equipment info in LabManager - requires login

TextTextTextTextTextText TextText



Equipment performance and process related parameters

Purpose

UV exposure

Performance Exposure mode
  • Flood exposure
  • Proximity exposure with mask possible for 4inch substrate
  • Inclined exposure
  • Rotating exposure
Exposure light/filters
  • Near UV(350-450nm)
  • Mid UV (260-320nm)
  • Deep UV(220-260nm)
Minimum structure size
Mask size

5x5inch optinal

Alignment modes

No alignment possible

Substrates Substrate size

Up to 8inch substrates, different shapes

Allowed materials

All cleanroom materials

Batch

1