Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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|style="background:LightGrey; color:black"|Link to safety APV and SDS (You must be logged in to Kemibrug to view SDSs) | |style="background:LightGrey; color:black"|Link to safety APV and SDS (You must be logged in to Kemibrug to view SDSs) | ||
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*:[http://labmanager. | *:[http://labmanager.nanolab.dtu.dk/d4Show.php?id=1897&mach=64 see APV here] | ||
*:[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESkhKSUxMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K see SDS here] | *:[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESkhKSUxMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K see SDS here] | ||
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*Wet thermal oxide:75-80nm/min | *Wet thermal oxide:75-80nm/min | ||
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*Wet thermal oxide:~25nm/min | *Wet thermal oxide:~6nm/min(1%) / 25nm/min(5%) | ||
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*Boronfloat and quartz: ~3-4 μm/min | *Boronfloat and quartz: ~3-4 μm/min | ||
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*BHF (12%HF with Ammoniumflouride) | *BHF (12%HF with Ammoniumflouride) | ||
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*5% HF | *1% / 5% HF | ||
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*40% HF | *40% HF | ||
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image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch. | image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch. | ||
image:RCA-HF.jpg|HF baths in RCA bench in B-1. | image:RCA-HF.jpg|HF baths in RCA bench in B-1. | ||
image:Stinkskab RR2.jpg|The | image:Stinkskab RR2.jpg|The HF bath in 'Fume hood(RCA)' in cleanroom B-1 is only for use during special RCA cleaning processes inside the fume hood. </gallery> | ||
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==Comparing different | ==Comparing different HF baths== | ||
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! | ! | ||
! 5% HF in RCA Bench | ! 5% HF in RCA Bench | ||
! 5% HF PP-bath | ! 1% / 5% HF PP-bath | ||
! 5% HF Plastic beaker | ! 1% / 5% HF Plastic beaker | ||
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