Specific Process Knowledge/Characterization: Difference between revisions
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===AFM=== | ===AFM=== | ||
*[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | *[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | ||
===Electrical measurements=== | |||
*[[/4-Point Probe|4-Point Probe]] | |||
*[[/Probe station|Probe station]] | |||
*[[/III-V ECV-profiler|III-V ECV-profiler (Electrochemical Capacitance-Voltage carrier density profiler)]] | |||
===Element analysis=== | ===Element analysis=== | ||
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===Optical microscopes=== | ===Optical microscopes=== | ||
*[[/Optical microscope|Optical microscopes]] | *[[/Optical microscope|Optical microscopes]] | ||
===Optical characterization=== | ===Optical characterization=== | ||
*[[/Optical characterization#Ellipsometer|Ellipsometer]] | *[[/Optical characterization#Ellipsometer|Ellipsometer]] | ||
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*[[LabAdviser/CEN/Tecnai TEM |Tecnai TEM]] | *[[LabAdviser/CEN/Tecnai TEM |Tecnai TEM]] | ||
=== | ===XRD=== | ||
*[[/ | *[[/XRD/XRD Powder|XRD Powder]], a tabletop XRD for Bregg-Brentano measurements of powder samples | ||
*[[/ | *[[/XRD/XRD SmartLab|XRD SmartLab]], an advanced multipurpose instrument from Rigaku in the cleanroom | ||
===Various=== | ===Various=== | ||
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*[[/Hardness measurement|Hardness tester]] | *[[/Hardness measurement|Hardness tester]] | ||
*[[/Particle Scanner Takano|Particle Scanner Takano]] | *[[/Particle Scanner Takano|Particle Scanner Takano]] | ||
==Decommissioned equipment== | ==Decommissioned equipment== | ||
*[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]] | *[[/KLA-Tencor Surfscan 6420|KLA-Tencor Surfscan 6420]] | ||
*[[/X-Ray Diffractometer|Phillips X-Ray Diffractometer that was owned by DTU Fotonik]] | *[[/X-Ray Diffractometer|Phillips X-Ray Diffractometer that was owned by DTU Fotonik]] | ||