Specific Process Knowledge/Lithography/Development: Difference between revisions

@@ Line 570: / Line 570: @@
 ===Process information===
+All recipes use the following structure:
+#Pressurize the TMAH canister
+#Dispense puddle while rotating substrate slowly
+#Puddle development while not rotating
+#Agitate substrate once per 30 seconds by rotating slowly for 1 second
+#Spin off developer
+#Clean substrate and chamber with DI water
+#Dry substrate and chamber with nitrogen
-'''Process recipes'''
+Multi-puddle recipes repeat steps 2-5 for the given number of puddles.
+'''Process recipes'''<br>
+SP: Single-puddle<br>
+MP: Multi-puddle
+*1 Rinse
+*2 SP 15s
+*3 SP 30s
+*4 SP 60s
+*5 SP 90s
+*6 SP 120s
+*7 MP 2x60 s
+*8 MP 4x60 s
+*9 MP 6x60 s
+<!--
 *DP 2x60s: Double puddle, 2 times 60s. Rinse and dry.
 *MP 4x60s: Multiple puddle, 4 times 60s. Rinse and dry.
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 *UTIL-DR: Dome rinse.
 *UTIL-BE: Bottle empty. Nanolab use only.
+-->
 === Equipment performance and process related parameters ===