Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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The trenches in deep silicon trenches can be characterized in many ways. Being able to compare processes requires that a set of common measurements and calculations must be established. Click '''HERE''' to find more information about the parameters used on the DRIE-Pegasus process developme[[Specific Process Knowledge/Etch/DRIE-Pegasus/TrenchCharacterisation|nt]]. | The trenches in deep silicon trenches can be characterized in many ways. Being able to compare processes requires that a set of common measurements and calculations must be established. Click '''HERE''' to find more information about the parameters used on the DRIE-Pegasus process developme[[Specific Process Knowledge/Etch/DRIE-Pegasus/TrenchCharacterisation|nt]]. | ||