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Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope: Difference between revisions

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* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034
* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034
* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
*[[Media:DREM2.pdf | ]]
* Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature: https://doi.org/10.1149/2162-8777/ab61ed
*[[Media:CORE1.pdf | Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature ]]
* Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects:
*[[Media:3DnanoSi.pdf | Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects]]
https://doi.org/10.1002/adom.201801176
*[[Media:Grassfree1.pdf | Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures]]
* Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures: https://doi.org/10.1016/j.mee.2020.111228


*[[Media:Grassfree1.pdf | ]]
*[[Media:3DnanoSi.pdf | ]]
*[[Media:CORE1.pdf |  ]]
*[[Media:DREM1.pdf | Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]
*[[Media:DREM1.pdf | Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]