Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 67: | Line 67: | ||
<br clear="all" /> | <br clear="all" /> | ||
[[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose]] | [[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The absolute exposure speed is for a 100 x 100 mm square exposure area.]] | ||
'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||
The writing speed remains almost constant up to a dose of 200 mJ/cm<sup>2</sup>. The writing speed is 50% at a dose of | The writing speed remains almost constant up to a dose of 200 mJ/cm<sup>2</sup>. The writing speed is 50% at a dose of 1000 mJ/cm<sup>2</sup>. | ||
<br clear="all" /> | <br clear="all" /> | ||