Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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=Alignment= | =Alignment= | ||
In order to get good alignment, it is advised to use four alignment marks for alignment, and to activate scaling (possibly also shearing) before starting the exposure. It is recommended to use the "High Res" camera for the final alignment of each mark in order to achieve the best overlay accuracy. Exposure using the fast mode decreases the overlay accuracy, since the address grid size is increased to 250 nm. | |||
In order to get good alignment, it is advised to use four alignment marks for alignment, and to activate scaling (possibly also shearing) before starting the exposure. It is recommended to use the "High Res" camera for the final alignment of each mark in order to achieve the best overlay accuracy. Exposure using the fast mode decreases the overlay accuracy, since the address grid size is increased to | |||
==Top Side Alignment== | ==Top Side Alignment== | ||
'''Overlay accuracy (spec):''' 0. | '''Overlay accuracy (spec):''' 0.5 µm | ||
'''Camera field of view (W x H):''' <br> | '''Camera field of view (W x H):''' <br> | ||