Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 51: | Line 51: | ||
Fast mode is used for maximum exposure speed.<br> | Fast mode is used for maximum exposure speed.<br> | ||
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively | In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively reduces the exposure time by 60%, but also increases the size of the address grid in the X-direction to 250 nm. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | ||
==Writing speed== | ==Writing speed== | ||