Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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Aligner: Maskless 03 offers two exposure modes. The exposure mode is selected during design conversion. | Aligner: Maskless 03 offers two exposure modes. The exposure mode is selected during design conversion. | ||
'''Quality''' | '''Quality:''' | ||
Quality mode is used for optimal resolution, best overlay accuracy, and minimum stripe stitching effects.<br> | |||
In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 100nm. | In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 100nm. | ||
'''Fast''' | '''Fast:''' | ||
Fast mode is used for maximum exposure speed.<br> | |||
In the fast mode, each area of the pattern is exposed by 2 stripes only. This reduces the exposure time by 60%, but also increases the size of the address grid in the X-direction to 250nm. This means that alignment will be less accurate in fast mode. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | In the fast mode, each area of the pattern is exposed by 2 stripes only. This reduces the exposure time by 60%, but also increases the size of the address grid in the X-direction to 250nm. This means that alignment will be less accurate in fast mode. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | ||