Specific Process Knowledge/Etch/RIE (Reactive Ion Etch): Difference between revisions
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[[Category: Equipment |Etch RIE]] | [[Category: Equipment |Etch RIE]] | ||
[[Category: Etch (Dry) Equipment |RIE]] | [[Category: Etch (Dry) Equipment |RIE]] | ||
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=<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = | =<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = | ||
* <span style="color:#FF0000"> This information is save because it might be valuable as inspiration for other dry etch systems. | * <span style="color:#FF0000"> This information is save because it might be valuable as inspiration for other dry etch systems. | ||