Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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|1PBSG | |1PBSG | ||
|~0.3 | |~0.3 | ||
| | |1.458@633nm | ||
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|} | |} | ||
=Recipes on PECVD3 for deposition of silicon oxides= | =Recipes on PECVD3 for deposition of silicon oxides= | ||