Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

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 *Click an instance of the pattern, it changes color to red
 *To the se actual pattern of the selected instance click '''View''' -> '''Shot shape display...'''
-*In '''Shot shape display...''' click '''Simulation'''
+*In '''Shot shape display''' click '''Simulation'''
-*Change the '''Objective aperture''' on the drop down to the correct aperture, in this case aperture 6 and click '''OK'''
+*Change the '''Objective aperture''' on the drop down to the correct aperture, in this case aperture 6 and click '''OK'''. This will set the correct beam size for visualization
+*In '''Shot shape display''' check off '''Field boundary, Colored shot rank, Fill in a pattern''' and choose '''ASD''' on the '''Shot form''' drop down
+*The pattern is now visible and one can zoom in to see individual beam shots and how they overlap with the selected scan pitch
 {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
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-'''ACHK''' shows how patterns are placed on the substrate. It will however only show the bounding box of the pattern. In this case the pattern is very small compared to the 4" wafer and thus one has to zoom into the center to see the 10 instances of the design. Image: Thomas Pedersen.
+Use Shot shape display to verify that the pattern and beam pitch/overlap looks as intended. Image: Thomas Pedersen.
 |}