Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

@@ Line 279: / Line 279: @@
 *Click an instance of the pattern, it changes color to red
 *To the se actual pattern of the selected instance click '''View''' -> '''Shot shape display...'''
-*
+*In '''Shot shape display...''' click '''Simulation'''
+*Change the '''Objective aperture''' on the drop down to the correct aperture, in this case aperture 6 and click '''OK'''
@@ Line 286: / Line 288: @@
 |-
 | [[image:9500achk1.png|500px]] || [[image:9500achk3.png|500px]]
+|-
+| colspan="2" style="text-align: center;|
+'''ACHK''' shows how patterns are placed on the substrate. It will however only show the bounding box of the pattern. In this case the pattern is very small compared to the 4" wafer and thus one has to zoom into the center to see the 10 instances of the design. Image: Thomas Pedersen.
+|}
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:9500shot1.png|400px]] || [[image:9500shot2.png|400px]] || [[image:9500shot3.png|400px]]
 |-
 | colspan="2" style="text-align: center;|