Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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Comparison of two drift measurements. Image: Thomas Pedersen. | |||
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In this example the two drift measurements are made a bit more than 1 minute apart (look at timestamps). The x-axis position shift has changed from 65.4 nm to 64.2 nm, i.e. a change of 1.2 nm in about 1 minute. The y-axis drift has changed from 85.3 nm to 86.8 nm, a shift of 1.5 nm in about 1 minute. Thus the drift is about 1-1.5 nm/min in this particular example. This is a typical value. If you experience drift of 5-10 nm/min, give the system 10 min to thermally equilibrate and try again. If drift is above 10 nm/min please call the e-beam personel. | |||
=Development= | =Development= | ||