Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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Result display of current measurement. Image: Thomas Pedersen. | Result display of current measurement. Image: Thomas Pedersen. | ||
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The next self check is to see if the machine can find the Absorbed Electron (AE) mark and the Backscatter Electron (BE) mark. The procedure is | |||
*Select the '''INITAE''' subprogram and click '''Execute''' | |||
*Verify that the graph in the SSP window shows the characteristic step function centered at 0 on the x-axis | |||
*Select the '''INITBE''' subprogram and click '''Execute''' | |||
*Verify that the graph in the SSP window shows the characteristic step function centered at 0 on the x-axis | |||
=Development= | =Development= | ||