Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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==Select and restore the system to the chosen beam current profile== | ==Select and restore the system to the chosen beam current profile== | ||
The SDF specifies which system condition file to use for the exposure, this determines the beam current. In this tutorial the chosen condition file is '''6nA_ap5'''. | |||
=Development= | =Development= | ||