Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=System calibration= | =System calibration= | ||
After cassette transfer the system has to be calibrated with the chosen beam current profile. This is done in a mostly automated sequence with only minute input from the user. The sequence is explained in detail in the following but | After cassette transfer the system has to be calibrated with the chosen beam current profile. This is done in a mostly automated sequence with only minute input from the user. The sequence is explained in detail in the following but in overview it is | ||
*Select and restore the system to the chosen beam current profile | *Select and restore the system to the chosen beam current profile | ||
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*Save data into calibration profile | *Save data into calibration profile | ||
*Execute pattern writing | *Execute pattern writing | ||
==Select and restore the system to the chosen beam current profile== | |||
=Development= | =Development= | ||