Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

Revision as of 19:45, 17 February 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Resist coating ← Older edit		Revision as of 19:50, 17 February 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Resist coating Newer edit →
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	[[File:TPE02755.jpg\|517px\|~~center~~\|~~frameless~~]]		[[File:TPE02755.jpg\|left\|517px\|thumb\|Full automatic Gamma UV + E-beam spin coater. Photo: Thomas Pedersen]] <br>

	=Pattern preparation=		=Pattern preparation=