Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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The SDF is the governing job descriptor. It defines which cassette to use for exposure, which slot of that cassette to expose, which beam current to expose with and the base dose of the exposure. The SDF will reference the JDF with further job information such as which pattern to write and where to write the pattern. The JDF will in turn reference a (or set of) V30 pattern files that hold the pattern(s) to write. | The SDF is the governing job descriptor. It defines which cassette to use for exposure, which slot of that cassette to expose, which beam current to expose with and the base dose of the exposure. The SDF will reference the JDF with further job information such as which pattern to write and where to write the pattern. The JDF will in turn reference a (or set of) V30 pattern files that hold the pattern(s) to write. | ||
For our example job we will use the following SDF. | For our example job we will use the following SDF. The commands are briefly described, for a more in depth explanation please consult the SDF/JDF preparation guide. | ||
<pre> | <pre> | ||