Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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Pattern placement is controlled with the ARRAY command in the JDF. The goal of this example exposure is to create a dose test and thus we will use the ARRAY command to create an array of the pattern (the DTU logo) and we will use the MODULAT command to modulate the dose for each instance in the array. | Pattern placement is controlled with the ARRAY command in the JDF. The goal of this example exposure is to create a dose test and thus we will use the ARRAY command to create an array of the pattern (the DTU logo) and we will use the MODULAT command to modulate the dose for each instance in the array. The ARRAY command takes six parameters as ARRAY(x,nx,dx)/(y,ny,dy), where x and y defines the center of the first element, nx and ny defines element numbers and dx and dy defines the array element pitch. The array defined in the example below will create a 10 x 1 array with an x-axis pitch of 50 µm. | ||
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PATH DRF5M Cyclic calibration definition | PATH DRF5M Cyclic calibration definition | ||
ARRAY (0,10,50)/(0,1,0) 10-1 array | ARRAY (0,10,50)/(0,1,0) 10-1 array around (0,0) with 50 µm pitch in x-axis | ||
ASSIGN P(1)->((1,1),SHOT1) | ASSIGN P(1)->((1,1),SHOT1) Pattern and modulation assignment to each array element | ||
ASSIGN P(1)->((2,1),SHOT2) | ASSIGN P(1)->((2,1),SHOT2) | ||
ASSIGN P(1)->((3,1),SHOT3) | ASSIGN P(1)->((3,1),SHOT3) | ||
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PEND | PEND | ||
LAYER 1 | LAYER 1 Definition of pseudo layer 1 | ||
P(1) 'dtu_logo_8mu.v30' | P(1) 'dtu_logo_8mu.v30' Assignment of P(1) to V30 file | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 Beam parameters | ||
STDCUR 2.2 ;nA | STDCUR 2.2 ;nA Beam current + 10% overhead | ||
SHOT1: MODULAT (( 0,0)) | SHOT1: MODULAT (( 0,0)) Dose modulation tables | ||
SHOT2: MODULAT (( 0,5)) | SHOT2: MODULAT (( 0,5)) | ||
SHOT3: MODULAT (( 0,10)) | SHOT3: MODULAT (( 0,10)) | ||