Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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The pattern used in this example is a simple grating pattern with 100 nm lines with a pitch of 250 nm. The pattern can be found here. | The pattern used in this example is a simple grating pattern with 100 nm lines with a pitch of 250 nm. The pattern can be found here. | ||
==JEOL 9500 example workflow== | ==JEOL 9500 example workflow== | ||