Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"|'''Lift-off''' | ||
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!style="background:silver; color:black; | !style="background:silver; color:black;" |Purpose | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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*Resist strip of wafers with metal | *Resist strip of wafers with metal | ||
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!style="background:silver; color:black; | !style="background:silver; color:black;"|Bath chemical | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
NMP (Remover 1165) / Rinse in IPA | NMP (Remover 1165) / Rinse in IPA | ||
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!style="background:silver; color:black | !style="background:silver; color:black" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Process temperature | |style="background:LightGrey; color:black"|Process temperature | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Heating of the bath is possible. | Heating of the bath is possible. | ||
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|style="background:LightGrey; color:black"|Ultrasonic agitation | |style="background:LightGrey; color:black"|Ultrasonic agitation | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Continuous or pulsed | Continuous or pulsed | ||
The power may be varied | The power may be varied | ||
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!style="background:silver; color:black | !style="background:silver; color:black" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Silicon or glass wafers | Silicon or glass wafers | ||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
1 - 25 | 1 - 25 | ||
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