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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Line 84: Line 84:
*'''(1004) DCH 100mm SP 90s'''
*'''(1004) DCH 100mm SP 90s'''
*'''(1003) DCH 100mm SP 120s'''
*'''(1003) DCH 100mm SP 120s'''
*'''(1005) DCH 150mm SP 60s'''


*'''(1005) DCH 150mm SP 60s'''


Multiple puddle:
Multiple puddle:
Line 93: Line 93:
*'''(1018) DCH 100mm MP 7x60s'''
*'''(1018) DCH 100mm MP 7x60s'''
*'''(1017) DCH 100mm MP 10x60s'''
*'''(1017) DCH 100mm MP 10x60s'''
*'''(1006) DCH 150mm MP 3x60s'''
*'''(1006) DCH 150mm MP 3x60s'''


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