Specific Process Knowledge/Lithography/Development: Difference between revisions
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==Developer: E-beam== | ==Developer: E-beam== | ||
[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam is located in E-4]] | [[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam is located in E-4]] | ||
Developer: E-beam is a manually operated, single substrate or chip spray-puddle developer. It uses the N50 or AR 600-546 developers and IPA for rinsing. The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is performed automatically by the equipment. | Developer: E-beam is a manually operated, single substrate or chip spray-puddle developer. It uses the N50 or AR 600-546 developers and IPA for rinsing. The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is performed automatically by the equipment. | ||
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'''[https://www.youtube.com/watch?v=btinNzYnLnY Training video]''' (for Developer: TMAH Manual, but it is the same model) | '''[https://www.youtube.com/watch?v=btinNzYnLnY Training video]''' (for Developer: TMAH Manual, but it is the same model) | ||
The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login''' | |||
===Process information=== | ===Process information=== | ||