Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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The user manual, quality control procedures and results, user APVs, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager] - '''requires login''' | The user manual, quality control procedures and results, user APVs, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager] - '''requires login''' | ||
===Exposure dose=== | ===Exposure dose=== | ||
[[Specific Process Knowledge/Lithography/Resist#Aligner:_MA6_-_2|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist#Aligner:_MA6_-_2|Information on UV exposure dose]] | ||
===Process information=== | ===Process information=== | ||
The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | ||
===Quality Control (QC)=== | ===Quality Control (QC)=== | ||
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===Alignment=== | ===Alignment=== | ||
'''Top Side Alignment:''' | '''Top Side Alignment:''' | ||
*TSA microscope standard objectives: 5X, and 10X (20X available) | *TSA microscope standard objectives: 5X, and 10X (20X available) | ||