Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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==Aligner: MA6 - 2== | ==Aligner: MA6 - 2== | ||
[[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]] | [[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]] | ||
The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. | The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. | ||
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The aligner can also be used for bond alignment (for Wafer Bonder 02). Special training is required. | The aligner can also be used for bond alignment (for Wafer Bonder 02). Special training is required. | ||
'''The user manual, quality control procedures and results, user APVs, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager] | '''Training videos:''' | ||
[https://www.youtube.com/watch?v=o8IBtfQHNzU Operation] | |||
[https://www.youtube.com/watch?v=rvUuXYgw-xU Alignment] | |||
The user manual, quality control procedures and results, user APVs, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager] - '''requires login''' | |||
===Exposure dose=== | ===Exposure dose=== | ||
[[Specific Process Knowledge/Lithography/Resist#Aligner:_MA6_-_2|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist#Aligner:_MA6_-_2|Information on UV exposure dose]] | ||
===Process information=== | ===Process information=== | ||
The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | ||
===Quality Control (QC)=== | ===Quality Control (QC)=== | ||
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*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=339 The QC procedure for Aligner: MA6-2]<br> | *[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=339 The QC procedure for Aligner: MA6-2] - '''requires login'''<br> | ||
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=339 The newest QC data for Aligner: MA6-2] | *[https://labmanager.dtu.dk/view_binary.php?type=data&mach=339 The newest QC data for Aligner: MA6-2] - '''requires login''' | ||
{| {{table}} | {| {{table}} | ||
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**Low: 1.5mm x 2mm (3mm x 2mm full field) | **Low: 1.5mm x 2mm (3mm x 2mm full field) | ||
**High: 450µm x 650µm (950µm x 650µm full field) | **High: 450µm x 650µm (950µm x 650µm full field) | ||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||