Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login''' | The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login''' | ||
===Exposure dose=== | ===Exposure dose=== | ||
[[Specific Process Knowledge/Lithography/Resist#KS_Aligner|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist#KS_Aligner|Information on UV exposure dose]] | ||
===Process information=== | ===Process information=== | ||
The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | ||
===Quality Control (QC)=== | ===Quality Control (QC)=== | ||