Specific Process Knowledge/Characterization/XRD: Difference between revisions
No edit summary |
|||
Line 115: | Line 115: | ||
|- | |- | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Sample stage | Sample stage motion | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*χ:-5~+95° | *χ:-5~+95° |
Revision as of 12:00, 11 May 2023
Feedback to this page: click here
Unless otherwise stated, this page is written by DTU Nanolab internal
XRD at DTU Nanolab
We have two X-ray diffraction setups in building 346:
- The XRD SmartLab primarily for thin film analysis inside the cleanroom.
- The XRD Powder for phase analysis of powders outside the cleanroom.
Experiments performed with XRD
Data analysis
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed a remote desktop with a licens for the Malvern Panalytical software, HighScore is available.
- Installing SmartLab Studio II
- Converting data from XRD Powder to SmartLab Studio II
- Guide for using SmartLab Studio II for data analysis
- Guide for using HighScore Plus for advanced powder data analysis
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD Powder | |
---|---|---|---|
Purpose | Crystal structure analysis and thin film thickness measurement |
|
|
X-ray generator |
Maximum rated output |
3 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
15 mA | |
Type |
Sealed tube |
Sealed tube | |
Target |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage motion |
|
Fixed with rotation | |
Sample size |
Diameter: 150 mm Thickness: 0~21 mm |
Powders | |
Optics | Incident side |
|
|
Receiver side |
|
| |
Substrates | Measurement temperature |
Room temperature |
May be heated in N2 up to 500°C |
Substrate size |
up to 150 mm wafers |
Only for powders | |
Allowed materials |
All materials |
All materials have to be approved |