Specific Process Knowledge/Lithography/SU-8: Difference between revisions

Revision as of 15:47, 30 January 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,890 edits →Exposure ← Older edit		Revision as of 15:49, 30 January 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,890 edits →Exposure Newer edit →
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	==Exposure==		==Exposure==
	~~The exposure~~ is ~~usually~~ done ~~in near UV~~-~~radiation in aligner systems, which blocks wavelengths below the i~~-line ~~(365nm wavelength)~~.		Exposing Su-8 is done using light sources at 375 nm or lower. SU-8 is not sensitive to H-line and above.