Specific Process Knowledge/Lithography/Coaters/GammaEbeam: Difference between revisions
Created page with "==Spin Coater: Gamma E-beam and UV== 400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5 Spin Coater: Gamma E-beam and UV was installed at DTU Nanolab in June 2017. It is a Gamma 4M cluster from Süss MicroTec with spin coating, HMDS vapour priming, and baking modules. The system handles 2", 4", and 6" wafers without size conversion, using two separate coater stations. The 2" coater station is equipped with 1 resist line,..." |
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* AR-P 6200.09 (CSAR) | * AR-P 6200.09 (CSAR) | ||
* AZ 5214E | * AZ 5214E | ||
* AZ MiR 701 (29cps) | * AZ MiR 701 (29cps) | ||
* AZ 4562 | * AZ 4562 | ||
* 30cc syringe dispense | * 30cc syringe dispense | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||
