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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,915 edits
Line 120: Line 120:
|Single puddle, 60 s
|Single puddle, 60 s
|PEB: 60 s at 110°C
|PEB: 60 s at 110°C
Side wall angle ~15°. For lover angle, develop 30 s (~5°)
Side wall angle ~15°
 
For smaller angle (~5°), develop 30 seconds instead
|}
|}
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