Specific Process Knowledge/Lithography/Development: Difference between revisions
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
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Development of | Development of: | ||
*SU-8 | *SU-8 | ||
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!style="background:silver; color:black;" align="center" width="60"|Developer | !style="background:silver; color:black;" align="center" width="60"|Developer | ||
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mr-Dev 600 | mr-Dev 600 | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method | ||
|style="background:LightGrey; color:black"|Development | |style="background:LightGrey; color:black"|Development | ||
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Submersion | Submersion | ||
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|style="background:LightGrey; color:black"|Handling | |style="background:LightGrey; color:black"|Handling | ||
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Single wafer holder | Single wafer holder | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | ||
|style="background:LightGrey; color:black"|Temperature | |style="background:LightGrey; color:black"|Temperature | ||
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Room temperature | Room temperature | ||
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|style="background:LightGrey; color:black"|Agitation | |style="background:LightGrey; color:black"|Agitation | ||
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Magnetic stirrer | Magnetic stirrer | ||
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|style="background:LightGrey; color:black"|Rinse | |style="background:LightGrey; color:black"|Rinse | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
IPA | IPA | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
* 100 mm wafers | *100 mm wafers | ||
150 mm wafer is possible if the level is high enough | *150 mm wafer is possible if the developer liquid level is high enough | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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Silicon and glass substrates | *Silicon and glass substrates | ||
*Film or pattern of all but Type IV | |||
Film or pattern of all but Type IV | |||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
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1-6 | 1-6 | ||
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<br clear="all" /> | <br clear="all" /> | ||