Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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!style="background:silver; color:black;" align="center"|Bath chemical | !style="background:silver; color:black;" align="center"|Bath chemical | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
NMP (Remover 1165) / Rinse in IPA | NMP (Remover 1165) / Rinse in IPA | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
User defined | User defined | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Process temperature | |style="background:LightGrey; color:black"|Process temperature | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Heating of the bath is possible. | *Heating of the bath is possible. | ||
*The heating has been limited to 60°C | |||
The heating has been limited to 60°C | |style="background:WhiteSmoke; color:black"| | ||
|style="background:WhiteSmoke; color:black | |||
Heating is possible using portable hotplate or portable ultrasonic bath | Heating is possible using portable hotplate or portable ultrasonic bath | ||
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|style="background:LightGrey; color:black"|Ultrasonic agitation | |style="background:LightGrey; color:black"|Ultrasonic agitation | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Continuous or pulsed | *Continuous or pulsed | ||
*The power may be varied | |||
The power may be varied | |style="background:WhiteSmoke; color:black"| | ||
|style="background:WhiteSmoke; color:black | |||
Ultrasonic agitation is possible using portable ultrasonic bath | Ultrasonic agitation is possible using portable ultrasonic bath | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
Silicon or glass wafers | *Silicon or glass wafers | ||
*Film or patterning of all except Type IV (Pb, Te) | |||
Film or patterning of all | |style="background:WhiteSmoke; color:black"| | ||
|style="background:WhiteSmoke; color:black | |||
Any cleanroom material | Any cleanroom material | ||
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