Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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* | * silicon | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||
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* | * Depending on the recipe | ||
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|style="background:LightGrey; color:black"|Uniformity | |style="background:LightGrey; color:black"|Uniformity | ||
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* | * Depending on the recipe | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range | !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range | ||