Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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MLA150 WMI maskless aligner from Heidelberg Instruments GmbH. | MLA150 WMI maskless aligner from Heidelberg Instruments GmbH. | ||
'''PC logon password''' | |||
The logon password for the PC is "mla" (without quotation marks). | The logon password for the PC is "mla" (without quotation marks). | ||
'''Special features''' | '''Special features''' | ||
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'''Special restrictions''' | '''<span style="color:red">Special restrictions</span>''' | ||
*No pneumatic autofocus | *No pneumatic autofocus | ||
*405 nm laser is not allowed | *405 nm laser is not allowed | ||
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*Thickness variations across the substrate must be <50 µm | *Thickness variations across the substrate must be <50 µm | ||
*Wafer bow must be <50 µm | *Wafer bow must be <50 µm | ||
'''[https://www.youtube.com/playlist?list=PLjWVU97LayHAiCabstMfAUeeWyQoQI_cV Training videos]''' | '''[https://www.youtube.com/playlist?list=PLjWVU97LayHAiCabstMfAUeeWyQoQI_cV Training videos]''' | ||
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| style="background:LightGrey; color:black"|Exposure light | | style="background:LightGrey; color:black"|Exposure light | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
* | *375 nm | ||
* | *<s>405 nm</s> NOT ALLOWED | ||
(laser diode arrays) | (laser diode arrays) | ||
|- | |- | ||
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|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
*Optical | *Optical | ||
*Pneumatic | *<s>Pneumatic</s> DISABLED | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Minimum structure size | |style="background:LightGrey; color:black"|Minimum structure size | ||