Specific Process Knowledge/Thin film deposition: Difference between revisions
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| align="left" valign="top" style="background:LightGray"|''' Semiconductors''' | | align="left" valign="top" style="background:LightGray"|''' Semiconductors''' | ||
| align="left" valign="top" style="background:#DCDCDC | | align="left" valign="top" style="background:#DCDCDC"|''' Oxides''' | ||
| align="left" valign="top" style="background:LightGray"|''' Nitrides''' | | align="left" valign="top" style="background:LightGray"|''' Nitrides''' | ||
| align="left" valign="top" style="background:#DCDCDC | | align="left" valign="top" style="background:#DCDCDC"|''' Carbon and Carbides''' | ||
| align="left" valign="top" style="background:LightGray"|''' | | align="left" valign="top" style="background:LightGray"|''' Metals''' | ||
| align="left" valign="top" style="background:#DCDCDC | | align="left" valign="top" style="background:#DCDCDC"|''' Alloys''' | ||
| align="left" valign="top" style="background: | | align="left" valign="top" style="background:LightGray"|''' Transparent conductive oxides''' | ||
| align="left" valign="top" style="background: | | align="left" valign="top" style="background:#DCDCDC"|''' Polymers''' | ||
| align="left" valign="top" style="background:LightGray"|''' Multilayers''' | |||
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[[/Deposition of Carbon|Carbon]] - ''and oxynitride'' <br/> | |||
[[/Deposition of Titanium Carbide|Titanium Carbide (TiC)]] - ''conductive ceramics'' <br/> | |||
[[/Deposition of Silicon Carbide|Silicon Carbide (SiC)]]<br/> | |||
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[[/Deposition of Aluminium|Aluminium]] <br/> | [[/Deposition of Aluminium|Aluminium]] <br/> | ||
[[/Deposition of Chromium|Chromium]]<br/> | [[/Deposition of Chromium|Chromium]]<br/> | ||
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[[/Sputter deposition of metals and alloys|AlCu]]<br/> | [[/Sputter deposition of metals and alloys|AlCu]]<br/> | ||
[[/Sputter deposition of metals and alloys|CoFe]]<br/> | [[/Sputter deposition of metals and alloys|CoFe]]<br/> | ||
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[[/Sputter deposition of oxides and other compounds|YSZ]] (Yttrium stabilized zirconia)<br/> | [[/Sputter deposition of oxides and other compounds|YSZ]] (Yttrium stabilized zirconia)<br/> | ||
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[[/Deposition of ITO|ITO (Tin doped Indium Oxide)]]<br/> | [[/Deposition of ITO|ITO (Tin doped Indium Oxide)]]<br/> | ||
[[/Deposition of AZO |AZO (Aluminum doped Zinc Oxide)]]<br/> | [[/Deposition of AZO |AZO (Aluminum doped Zinc Oxide)]]<br/> | ||
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[[Specific Process Knowledge/Lithography/SU-8|SU-8]]<br/> | [[Specific Process Knowledge/Lithography/SU-8|SU-8]]<br/> | ||
[[Specific Process Knowledge/Thin film deposition/MVD#Processing on the MVD| Antistiction coating]] <br/> | [[Specific Process Knowledge/Thin film deposition/MVD#Processing on the MVD| Antistiction coating]] <br/> | ||