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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 131: Line 131:
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
|align="left"| InP || (x) ||  ||  || ? || AR800-30 is being tested (leaves residue)
|align="left"| InP || (x) ||  ||  || ? || AR800-30 is being tested (leaves residue)
|-
|-style="background:#C0C0C0;" align="center"
|align="left"| GaN || (x) ||  ||  || ? ||
|-
|-style="background:#DCDCDC;" align="center"
|align="left"| InN || (x) ||  ||  || ? ||
|}
|}


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