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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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|-
|-
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
|align="left"| Silicon with native oxide || (x) || x || X || (x)
|align="left"| Silicon with native oxide || (x) || x || x || (x)
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:#C0C0C0;" align="center"
|align="left"|Silicon oxide || (x) ||  || X || (x)
|align="left"|Silicon oxide || (x) ||  || x || (x)
|-
|-
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
|align="left"| Silicon nitride || (x) ||  || X || (x)
|align="left"| Silicon nitride || (x) ||  || x || (x)
|-
|-
|}
|}
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