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Specific Process Knowledge/Thin film deposition/Deposition of Chromium: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 34: Line 34:
|10Å to 1µm*
|10Å to 1µm*
|10Å to 1µm*
|10Å to 1µm*
|10Å to 1000 Å
|80 nm
|at least up to 200 nm
|at least up to 200 nm
|at least up to 200 nm
|at least up to 200 nm
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